Certificates of analysis
Safety data sheets
Application & Process Support Environmental, Health & Safety
J.T.Baker® brand CLk™ photoresist and residue removal products are engineered to demanding requirements of the integration of copper interconnects in current and advanced technology nodes. The J.T.Baker® CLk™ photoresist and residue removal product line is proven to remove resist and polymer ash resulting from current generation processes such as copper damascene patterning, dual damascene metal deposition, and oxygen plasma strip. It also offers excellent performance for devices in higher nodes using copper metal lines.
Click here to download a copy of "Selection Guide for Copper Low-k" (PDF)
Avantor® is a global manufacturer and
distributor of high-quality products, services and solutions to professionals
in the life sciences and advanced technology industries. As our channel brand,
VWR offers an integrated, seamless purchasing experience that is optimized for
the way our customers do business. Operating from over 30 countries worldwide,
the company seeks to enable customer success in the biopharmaceutical,
pharmaceutical, medical device, diagnostics, healthcare, educational,
industrial, government, aerospace & defense, and semiconductor industries.